52.75.-d Plasma devices and applications (see also 28.52 Fusion reactors; for ion sources, see 29.25.L, N; for plasma sources, see 52.50.D) ( 0 Dok. )

• 52.75.Di Accelerators and propulsion ( 0 Dok. )
• 52.75.Fk Magnetohydrodynamic generators and thermionic convertors; plasma diodes (see also 84.60.L, N in direct energy conversion and storage) ( 0 Dok. )
• 52.75.Hn Plasma torches ( 0 Dok. )
• 52.75.Kq Plasma switches (e.g., spark gaps) ( 0 Dok. )
• 52.75.Ms Free-electron devices (for free-electron lasers, see 41.60.C) ( 0 Dok. )
• 52.75.Pv High-voltage diodes (for high-current and high-voltage technology, see 84.70) ( 0 Dok. )
• 52.75.Rx Plasma applications in manufacturing and materials processing (etching, surface cleaning, spraying, arc welding, ion implantation, film deposition, etc.) ( 0 Dok. )
• 52.75.Va Devices for generation of coherent radiation ( 0 Dok. )